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Advanced Logic
Process
Development &
Integration


- SiO2/SiON Gate Dielectrics
- High-K/Metal Gate
- Etch
- Thin Film
- Silicide
- Ultra Shallow Junction
   (including RTA & LSA)
- Cu/Ultra Low-K
- Strain Engineering
- Lithography(including OPC/RET)
- FEOL/BEOL Process Integration


- foundry, logic, image
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   business processes¿¡
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Device & Reliability
Engineering


- Device & Reliability Engineering
- Device Physics and Optimization
- SRAM Development
- Device Reliability
   (including BEOL reliability)
- Strain/SPICE Modeling & Simulation


Design Infra
Development


- DFM Engineering
- Design Rule Generation
- Design Infra System


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- Defect & Yield Engineering
- CMOS Image Sensor Development,
   Integration, Device & Analysis
- Power Device Process Development,
   Integration, Device & Analysis


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Photo


- Litho process engineer
- Litho equipment engineer for scanner
- Litho equipment engineer for spinner


- defect reduction °³¼±
- foundry customerÇù¾÷
- photo resist
   ¶Ç´Â applicable materials °æÇè


Etch


- Logic/Foundry Etch Process engineer
- 300mm FAB Dry Etch Process engineer
- Defect/Yield management engineer
- Dry Etch Process department manager


- 3³â ÀÌ»óÀÇ 300m ¹ÝµµÃ¼
   Fab process °æÇèÀÚ
- dry etch process °æÇèÀÚ
   (STI, Gate, Spacer, MC,
   Single/Dual Damascene)
- Fab process ±â¼ú º¸À¯ÀÚ


Metal


- Metal equipment engineer
- Metal process engineer


- ÃÖ¼Ò 2³â ÀÌ»óÀÇ FAB
   equipment/process
   engineer °æÇèÀÚ


CVD


- CVD equipment engineer
- CVDl process engineer
- Defect improvement
- Foundry FAB operation, system expert


- ÃÖ¼Ò 2³â ÀÌ»óÀÇ FAB
   equipment/process
   engineer °æÇèÀÚ


Diffusion
Cleaning
Implantation


- Metal equipment engineer
- Metal process engineer


- Quality tool¿¡ ´ëÇÑ ÀÌÇØµµ
- FMEAs
- 6 Sigma
- SPC implementation


CMP


- New Device CMP Process Development
   engineer
- CMP defects engineering analysis
- New CMP slurries and post CMP
   cleaning solutions developer
- New CMP consumables    (Pad,conditioning  disk µî) developer
- Foundry business customer
   correspondence for CMP processes


- CMP process Àü¹®°¡
- Pattern Density Effect
   on CMP ´ëÇÑ Áö½Ä º¸À¯ÀÚ
- Slurry/Cleaning
   Chemical Formulation
   ´ëÇÑ ÀÌÇØ ù±
- 8 Module Process¿¡ ´ëÇÑ
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PIE


- Yield improvement & qualification of
   new process technology
- Electrical data distribution
   improvement & ensure sufficient
   margin to prevent scraps
- Identifying line excursion & root cause
   analysis


- FEOL/BEOL °æÇèÀÚ
- ¹ÝµµÃ¼ processing/
   device physic ´ëÇÑ ÀÌÇØ ù±


Defect analysis


- Defect Monitoring System & Control
   specialist
- Defect Analysis & Reduction specialist


- ¹ÝµµÃ¼ °ü·Ã ¾÷°è Á¾»çÀÚ
- ¹ÝµµÃ¼Chip Maker °æÇèÀÚ
- °Ë»ç ¼³ºñTool Maker Ãâ½Å
- OCD °èÃø¼³ºñ Tool Maker Ãâ½Å
- Defect data ºÐ¼®°¡´ÉÀÚ


Failure analysis


- SRAM & Logic Test specialist
- Device level analysis specialist
- Physical Failure Analysis Tool(STEM,
   SEM, FIBµî)À» Ȱ¿ëÇÑ ºÐ¼®


- ¹ÝµµÃ¼ °ü·Ã ¾÷°è Á¾»çÀÚ
- Logic Chip ºÐ¼® °æÇèÀÚ
- ºÐ¼® Tool(TEM, SEM, FIB)
   °æÇèÀÚ
- Logic/SRAM Test °æÇèÀÚ
- ¼ÒÀÚLevel Ư¼ºÆò°¡ °æÇèÀÚ


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      ¡Ø Dearsamsung.co.kr >> °æ·Â»ç¿øÃ¤¿ë >> [»ï¼ºÀüÀÚ]DS»ç¾÷ÃѰý S.LSI»ç¾÷ºÎ FoundryºÐ¾ß ä¿ë°ø°í

         >> È­¸é¾Æ·¡ "Áö¿ø" ¹öư Ŭ¸¯ ÈÄ Áö¿ø¼­ ÀÛ¼º >> »õ·Î¿î À̷¼­ ÀÛ¼º

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   - °¢Á¾ Áõºù¼­·ù(¾îÇÐ, ÇÐÀ§, °æ·Â°ü·Ã Áõ¸í¼­)Á¦ÃâÀº º°µµ¾È³» ¿¹Á¤À̸ç, Á¦Ãâ¼­·ù Áß

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   - »ï¼ºÀüÀÚ S.LSI»ç¾÷ºÎ ±è¼º¸ð »ç¿ø(031-209-8305, smyo.kim@samsung.com)



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2011. 08

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